DCM-SAM: Defect-Conditioned Mixture of LoRA Experts for NPU-Deployed AM Defect Segmentation

תקציר מקורי באנגליתarXiv:2609.38811v1 Announce Type: cross Abstract: Metal additive manufacturing parts are inspected by X-ray computed tomography, where labelled data is scarce, the pores and inclusions that matter span a few pixels, and inspection must happen at the machine. We present DCM-SAM, a defect-conditioned adaptive mixture of LoRA experts: one frozen Segment Anything backbone carries a separate Conv-LoRA expert bank and mask decoder per defect class, each trained in its own pass, without prompts, on synthetic slices alone, updating only 4.4% of the parameters. On benchmarks that XCT-SAM reports, DCM-SAM improves on every baseline for both classes from a ViT-B backbone against their ViT-H, and reaches 64.2% pore IoU on real NIST scans having seen no real images during training. Deployment then expo